山东彩票

应用

Fabrication and Characterisation of Light Emitting Devices

有关: 光子学

Ensuring optimal emission from any device requires high-quality fabrication.  From uniform quantum well depth in GaAs/AlGaAs to smooth sidewalls in InP waveguides or GaN high brightness LEDs we have the process solution. Our long experience in the processing on GaN and III-V materials means that we understand what it takes to deliver high throughput of high-quality devices in batch or single wafer fabrication. Our GaN etch is low damage to maintain surface quality while we offer both selective and non-selective etches for GaAs/AlGaAs to provide optimum quality whether the challenge is no notching of side walls in VCSELs  or accurate depth control. Once a process has been completed it is very obviously important to characterise the results. Photonic multiple quantum well structures can have QW depths of less than 5 nm. For these structures, elemental characterisation is usually achieved using elemental dispersive spectroscopy and transmission electron microscopy (TEM). Our range of X-Max EDS detectors for TEM ensures high throughput and accurate results due to optimised sensors that deliver the highest possible sensitivity. This allows the mapping of nanometer size device features in minutes so that the real distribution of elements in a specimen can be characterised and the success of a fabrication process understood. 

Plasma Process Solutions for BioMEMS Applications

产品

结合了波谱仪解析X射线谱峰灵敏性、微量及痕量元素准确性以及能谱仪检测元素时的高速及高灵活性的优势。发挥波谱仪高X射线分辨率的特点,能够在更低的检测限下解析复杂的谱峰重叠。作为在高计数率下也可实现高准确定量分析的

波谱仪

发现更多
的独特功能及的速度和灵活性,可解析X射线谱峰,对微量元素和痕量元素进行定量分析。AZtec软件完全集成了

AZtecWave

发现更多

学习中心内容

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